Nozzle type cleaner "PULSE JET" point type
- Applying ultrasonic pressure to the water stream from the nozzle creates particle acceleration in the water and the water particle motion removes submicron contamination on the objective works
- Fresh DI water supply avoids re-contamination within the cleaning media.
- Suitable for single wafer processing system.
- High frequency ultrasound (megasonic) is effective for fine particle contamination.
- Output power control can adjust the power and suitable for delicate object like magnetic head.
- 400kHz | W-357-04PG : Combination with high power transducer for high power application
- 1MHz | W-357-1MPG : Power stabilized generator saves electric power consumption and reliable cleaning power.
*CE Compliance is possible
- 1.5MHz | W-357-1.5MPG : Higher frequency drive is useful for finer particle contamination. RS-422A communication is equipped.
- 3MHz | W-357-3MPG : Very high, 3 MHz system. For the finest semiconductor process.
- Minimum Order Quantity: 1 piece